Deposition of Zinc Oxide thin film layer with the help of modified sputtering system
نویسنده
چکیده
The process of magnetron sputtering of dielectric zinc oxide (ZnO) films at a constant current source, was studied. It is demonstrated that this method of dielectric films deposition makes it possible to obtain high-quality coatings and layers that meet the requirements for creating multilayer diffractive optical elements.
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